White Nitrile Gloves – 12″, Silicone-Free, Powder-Free, for Semiconductor Use

• 12″ Long Cuff
• Silicone-Free
• Powder-Free
• No Fingerprint Residue
• Cleanroom Processed
• OEM / Vacuum Packaging
• Sizes: S–XL
• MOQ: 200 Cartons

Description

Ultra-Clean Gloves for Semiconductor Manufacturing

These 12-inch white nitrile gloves are specially engineered for semiconductor and microelectronics applications where purity, precision, and static control are critical. Designed to be powder-free, silicone-free, and fingerprint-free, they prevent contamination of wafers, optics, and high-sensitivity components.

Each glove undergoes ultra-pure water rinsing, low-residue surface treatment, and is produced in a certified Class 100 cleanroom to ensure minimal NVR, particles, and ionic contamination. Ideal for wafer fabrication, clean packaging, and photolithography processes.

Key Features

Silicone-Free & Fingerprint-Free
No risk of silicone outgassing or print residue—perfect for wafer and optical surfaces.
Powder-Free & Latex-Free
Eliminates airborne particles and skin irritation risks.
Cleanroom Processed (Class 100)
Rinsed with 18MΩ ultra-pure water and vacuum double-packed.
Extended 12-Inch Cuff
Forearm coverage for splash control in contamination-critical areas.
Certified Quality
Full traceability, ISO-compliant production, and test reports available.

Technical Specifications

Specification	Details
Material	Nitrile (Latex-Free, Silicone-Free)
Color	White
Length	12 inches (300 mm)
Surface Texture	Smooth, Low-Residue
Thickness	4.5 mil (nominal)
Powder	Powder-Free
Fingerprint Transfer	None (Tested)
Sizes Available	S, M, L, XL
Packaging	100 pcs/double-bagged, vacuum sealed, 10 bags/carton
MOQ	200 cartons
Certifications	ISO 9001, RoHS, CE, FDA (upon request)

Testing & Compliance Report Summary

All gloves are tested in certified environments with documented results:

Test Item	Result	Standard / Method
Non-Volatile Residue (NVR)	≤ 0.50 mg/g	IEST-RP-CC005.4
Particles (≥0.5μm/glove)	≤ 1200 pcs	IEST-RP-CC005.4 (Dry APC)
Ionic Contamination	≤ 0.20 μg/cm² (Cl⁻, Na⁺, etc.)	Ion Chromatography (IC)
Silicone Detection	Not Detected (<10 ppb)	GC-MS / FTIR
Fingerprint Residue	None Visible (Optical Wafer Test)	Internal Clean Glass Protocol
Powder Residue	None Detected	Gravimetric Method
Tensile Strength	≥ 14 MPa	ASTM D412
Puncture Resistance	≥ 6 N	EN 455-2